Film formation is possible from a single sheet - Film formation processing (CVD)
Low-temperature CVD allows for film formation at temperatures below 100°C and can also deposit films on substrates of various shapes and materials such as resins and films.
We offer contract processing for film deposition, focusing on SiO2 and SiN from PE=CVD. We can sometimes accommodate requests for thick thermal oxide films and a small number of thermal oxide films with our stock items, so please feel free to contact us. For more details, please download the catalog or contact us.
- 企業：大村技研
- 価格：Other
